Modeling of influence of the insulating film thickness non-uniformity along the cathode surface on its emission properties in glow gas discharge

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Abstract

A model of the cathode sheath of glow gas discharge at the existence of an insulating oxide film on the cathode surface, which thickness has non-equal values at its different sections, is formulated. An influence of the film thickness non-uniformity on the cathode effective ion-electron emission yield and discharge cathode sheath characteristics is investigated.

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About the authors

G. G. Bondarenko

National Research University «Higher School of Economics»

Email: kristya@bmstu.ru
Russian Federation, Moscow, 101000

M. R. Fisher

Bauman Moscow State Technical University, Kaluga Branch

Email: kristya@bmstu.ru
Russian Federation, Kaluga, 248000

V. I. Kristya

Bauman Moscow State Technical University, Kaluga Branch

Author for correspondence.
Email: kristya@bmstu.ru
Russian Federation, Kaluga, 248000

References

  1. Райзер Ю.П. Физика газового разряда. Долгопрудный: ИД “Интеллект”, 2009. 736 с.
  2. Кудрявцев А.А., Смирнов А.С., Цендин Л.Д. Физика тлеющего разряда. СПб.: Лань, 2010. 512 с.
  3. Schwieger J., Baumann B., Wolff M. et al. // J. Phys. Conf. Ser. 2015. V. 655. Art. No. 012045.
  4. Langer R., Garner R., Paul I. et al. // Eur. Phys. J. Appl. Phys. 2016. V. 76. No. 1. Art. No. 10802.
  5. Savoye E.D., Anderson D.E. // J. Appl. Phys. 1967. V 38. No. 8. P. 3245.
  6. Riedel M., Düsterhöft H., Nagel F. // Vacuum. 2001. V. 61. P. 169.
  7. Bondarenko G.G., Fisher M.R., Kristya V.I., Prassitski V.V. // Vacuum. 2004. V. 73. P. 155.
  8. Suzuki M., Sagawa M., Kusunoki T. et al. // IEEE Trans. ED. 2012. V. 59. No. 8. P. 2256.
  9. Bondarenko G.G., Fisher M.R., Kristya V.I. // Vacuum. 2016. V. 129. P. 188.
  10. Bondarenko G.G., Kristya V.I., Savichkin D.O. // Vacuum. 2018. V. 149. P. 114.
  11. Кристя В.И., Мьо Ти Ха // Поверхность. Рентген. синхротр. и нейтрон. исслед.2020. № 5. С. 63; Kristya V.I., Myo Thi Ha // J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 2020. V. 14. No. 3. P. 490.
  12. Кристя В.И., Мьо Ти Ха, Фишер М.Р. // Изв. РАН. Сер. физ. 2020. Т. 84. № 6. С. 846; Kristya V.I., Myo Thi Ha, Fisher M.R. // Bull. Russ. Acad. Sci. Phys. 2020. V. 84. No. 6. P. 698.
  13. Бондаренко Г.Г., Кристя В.И., Мьо Ти Ха, Фишер М.Р. // Поверхность. Рентген. синхротр. и нейтрон. исслед.2022. № 8. С. 25; Bondarenko G.G., Kristya V.I., Myo Thi Ha, Fisher M.R. // J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 2022. V. 16. No. 4. P. 581.
  14. Woodworth J.R., Aragon B.P., Hamilton T.W. // Appl. Phys. Lett. 1997. V. 70. No. 15. P. 1947.
  15. Kim D., Economou D.J. // J. Appl. Phys. 2003. V. 94. No. 5. P. 2852.
  16. Kim D., Economou D.J. // J. Appl. Phys. 2004. V. 95. No. 7. P. 3311.
  17. Бондаренко Г.Г., Кристя В.И., Йе Наинг Тун // Изв. вузов. Физ. 2015. Т. 58. № 9. С. 99; Bondarenko G.G., Kristya V.I., Tun J.N. // Russ. Phys. J. 2016. V. 58. No. 9. P. 1313.
  18. Phelps A.V., Petrović Z. Lj. // Plasma Sources Sci. Technol. 1999. V. 8. No. 3. P. R21.
  19. Forbes R.G., Edgcombe C.J., Valdrè U. // Ultramicroscopy. 2003. V. 95. P. 57.
  20. Hourdakis E., Bryant G.W., Zimmerman N.M. // J. Appl. Phys. 2006. V. 100. No. 12. Art. No. 123306.
  21. Sun L., Zhou W., Jiang W. et al. // J. Phys. D. Appl. Phys. 2020. V. 53. No. 45. Art. No. 455201.
  22. Крютченко О.Н., Маннанов А.Ф., Носов А.А. и др. // Поверхность. Физика, химия, механика. 1994. № 6. С. 93.
  23. Xu N.S., Chen J., Deng S.Z. // Appl. Phys. Lett. 2000. V. 76. No. 17. P. 2463.
  24. Klas M., Černák P., Borkhari A.F. et al. // Vacuum. 2021. V. 191. Art. No. 110327.
  25. Forbes R.G. // J. Vac. Sci. Tech. B. 1999. V. 17. No. 2. P. 534.
  26. Kusunoki T., Sagawa M., Suzuki M. et al. // IEEE Trans. ED. 2002. V. 49. No. 6. P. 1059.
  27. Зыкова Е.В., Кучеренко Е.Т., Айвазов В.Я. // Радиотехн. и электрон. 1979. Т. 24. № 7. С. 1464.
  28. Rózsa K., Gallagher A., Donkó Z. // Phys. Rev. E. 1995. V. 52. No. 1. P. 913.
  29. Eckertova L. // Czech. J. Phys. B. 1989. V. 39. No. 5. P. 559.
  30. Eckertova L. // Int. J. Electron. 1990. V. 69. No. 1. P. 65.
  31. Hickmott T.W. // J. Appl. Phys. 2000. V. 87. No. 11. P. 7903.
  32. Hickmott T.W. // J. Appl. Phys. 2010. V. 108. No. 9. Art. No. 093703.
  33. Кристя В.И., Мьо Ти Ха, Фишер М.Р. // Поверхность. Рентген. синхротр. и нейтрон. исслед.2019. № 4. С. 79; Kristya V.I., Myo Thi Ha, Fisher M.R. // J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 2019. V. 13. No. 2. P. 339.

Supplementary files

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2. Fig. 1. Dependence of the emission efficiency of sections of a dielectric film of thickness Hfk on the cathode surface (dashed lines, 1 – Hf2 = 5 nm, 2 – Hf3 = 6 nm, 3 – Hf4 = 7 nm, 4 – Hf5 = 8 nm) on the discharge current density, as well as its value averaged over the cathode surface (solid line).

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3. Fig. 2. Dependence of the effective coefficient of ion-electron emission of cathode sections with a dielectric film of thickness Hfk (dashed lines, 1 – Hf2 = 4 nm and Hf2 = 5 nm, 2 – Hf3 = 6 nm, 3 – Hf4 = 7 nm, 4 – Hf5 = 8 nm) on the discharge current density, as well as its value averaged over the cathode surface (solid line).

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4. Fig. 3. Volt-ampere characteristic of a glow discharge in argon with a cathode without a dielectric film (dashed line), with a film of constant thickness (solid line 1) and with a film of variable thickness (solid line 2). The dots are the experimental values ​​of the cathode voltage drop Uc in the case of a cathode without a film [28].

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