New concept for the development of high-performance X-ray lithography

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Abstract

A brief overview of the current state of extreme ultraviolet (UV, EUV in English transcription), or, also, X-ray lithography at a wavelength of 13.5 nm in the world is given. The problems and prospects for the development of this technology in the coming years are discussed. A new concept of X-ray lithography in Russia is being developed at the Institute of Microstructure Physics of the Russian Academy of Sciences. The substantiation of the advantages and prospects of the feasibility of lithography at a wavelength new to lithography of 11.2 nm is given. A brief overview of the domestic level of development of critical technologies necessary for the creation of an X-ray lithograph is given.

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N. I. Chkhalo

Federal State Budgetary Scientific Institution “Federal Research Center Institute of Applied Physics named after. A. V. Gaponova-Grekhov Russian Academy of Sciences”

Author for correspondence.
Email: chkhalo@ipmras.ru

Institute of Physics of Microstructures of the Russian Academy of Sciences

Russian Federation, Nizhny Novgorod region

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