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Authors
Vol 53, No 5 (2024)
Electron cyclotron resonance plasma studies using the second cyclotron harmonic resonance
Kovalchuk А.V., Shapoval S.Y.
PDF
(Rus)
Vol 52, No 1 (2023)
Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy
Murin D.B., Chesnokov I.A., Pivovarenok S.A., Efremov A.M.
PDF
(Rus)
Vol 52, No 2 (2023)
Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture
Efremov A.M., Betelin V.B., Kwon K.
PDF
(Rus)
Vol 52, No 4 (2023)
Concentration of Fluorine Atoms and Kinetics of Reactive-Ion Etching of Silicon in CF4 + O2, CHF3 + O2, and C4F8 + O2 Mixtures
Efremov A.M., Bobylev A.V., Kwon K.
PDF
(Rus)
Vol 52, No 5 (2023)
The Influence of Small F2, H2, and HF Additives on the Concentration of Active Particles in Tetrafluoromethane Plasma
Efremov A.M., Smirnov S.A., Betelin V.B.
PDF
(Rus)
Vol 53, No 1 (2024)
Parameters and Composition of Plasma in a Mixture of CF4 + H2 + Ar: Effect of the CF4/H2 Ratio
Miakonkikh A.V., Kuzmenko V.O., Efremov A.M., Rudenko K.V.
PDF
(Rus)
Vol 53, No 6 (2024)
Plasma Parameters and Si/SiO2 Etching Kinetics in Mixtures of Fluorocarbon Gases with Argon and Helium
Efremov A.M., Betelin V.B., Kwon K.H.
PDF
(Rus)
Vol 53, No 3 (2024)
Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
Murin D.B., Grazhdyan A.Y., Chesnokov I.A., Gogulev I.A.
PDF
(Rus)
Vol 53, No 6 (2024)
Gas Phase Composition and Fluorine Atom Kinetics in SF6 Plasma
Myakonkikh A.V., Kuzmenko V.O., Efremov A.M., Rudenko K.V.
PDF
(Rus)
Vol 53, No 4 (2024)
Plasmochemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium
Murin D.B., Chesnokov I.A., Gogulev I.A., Anokhin A.L., Moloskin A.E.
PDF
(Rus)
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