Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma

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Abstract

The influence of the addition of hydrogen on the electrophysical parameters and emission spectra of tetrafluoromethane under conditions of a direct current glow discharge has been studied. It has been established that gas temperature changes nonlinearly with increasing proportion of hydrogen in the plasma-forming mixture. The emission spectra of tetrafluoromethane plasma with hydrogen were obtained and analyzed. It is shown that plasma radiation is represented by atomic and molecular components, and the dependences of the line radiation intensities on the external conditions of the discharge are determined by the excitation of emitting states during direct electron impacts.

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About the authors

D. B. Murin

Federal State Budgetary Educational Institution of Higher Education “Ivanovo State Chemical-Technological University”

Author for correspondence.
Email: dim86@mail.ru
Russian Federation, Ivanovo

A. Yu. Grazhdyan

Federal State Budgetary Educational Institution of Higher Education “Ivanovo State Chemical-Technological University”

Email: dim86@mail.ru
Russian Federation, Ivanovo

I. A. Chesnokov

Federal State Budgetary Educational Institution of Higher Education “Ivanovo State Chemical-Technological University”

Email: dim86@mail.ru
Russian Federation, Ivanovo

I. A. Gogulev

Federal State Budgetary Educational Institution of Higher Education “Ivanovo State Chemical-Technological University”

Email: dim86@mail.ru
Russian Federation, Ivanovo

References

  1. Danilin B.S., Kireev V.Yu. Application of low-temperature plasma for etching and cleaning of materials. Moscow: Energoatomizdat, 1987. P. 264.
  2. Svetsov V.I., Efremov A.M. Vacuum and plasma electronics: textbook. Ivanovo: Ivanovsk. Gos. Khim.Tekhnol. Univ. 2003. 171 p. ISBN 5-9616-0155-2.
  3. Wolf S., Tauber R.N. Silicon Processing for the VLSI Era. V. 1. Process Technology. N. Y.: Lattice Press, 2000. 890 p. ISBN: 0961672137.
  4. Efremov A.M., Murin D.B. Kinetics of heterogeneous death of chlorine and hydrogen atoms in the plasma of binary mixtures HCl + Ar, H2, O2 and Cl2 // High Energy Chemistry. 2015. V. 49. No. 4. P. 318. https://doi.org/ doi: 10.1134/S0018143915040062
  5. Efremov A.M., Murin D.B. Electrophysical parameters of plasma of binary mixtures HCl + Ar, He, H2, O2 and Cl2 // News of higher educational institutions. series: chemistry and chemical technology. 2021. Vol. 58. No. 4. Р. 14—18.
  6. Pivovarenok S.A., Murin D.B., Grazhdyan A.Yu. The influence of the composition of the mixture on the electrophysical parameters and emission spectra of plasma of tetrafluoromethane and trifluoromethane with nitrogen // High Energy Chemistry. 2023. V. 57. No. 2. P. 144—148. https://doi.org/DOI: 10.31857/S0023119323020080
  7. Murin D.B., Efremov A.M., Svetsov V.I., Pivovarenok S.A., Godnev E.M. Radiation intensity and concentration of neutral particles in the plasma of a DC glow discharge in HCl—H2 and HCl—O2 mixtures // News of higher educational institutions. Series: Chemistry and chemical technology. 2013. V. 56. No. 8. P. 41—44.
  8. Murin D.B., Efremov A.M., Svetsov V.I., Pivovarenok S.A., Ovtsyn A.A., Shabadarov S.S. Radiation intensity and concentration of active particles in glow discharge plasma in mixtures of hydrogen chloride with argon and helium // News of higher educational institutions. Series: Chemistry and chemical technology. 2013. V. 56. No. 4. P. 29—32.
  9. Lebedev Yu.A. Methods of contact diagnostics in nonequilibrium plasma chemistry. Moscow: Nauka, 1981. 142 p.
  10. Rokhlin G.N. Discharge light sources. Ed. 2nd; reworked and additional. Moscow: Energatomizdat, 1991. 720 p. ISBN 5-283-00548-8.
  11. Murin D.B., Dunaev A.V. Electrophysical parameters and emission spectra of boron trichloride plasma // Microelectronics. 2018. V. 47. No. 2. Р. 106—114. https://doi.org/DOI: 10.1134/S1063739718020075
  12. Pierce R., Gaydon A. Identification of molecular spectra. Moscow: Izd. inostr. lit., 1949. 540 p. ISBN: 978-94-009-5760-2.
  13. Sventitsky A.R., Striganov N.S. Tables of spectral lines of neutral and ionized atoms. Moscow: Atomizdat, 1966. 900 p. https://doi.org/10.1007/978-1-4757-6610-3
  14. Murin D.B., Pivovarenok S.A., Chesnokov I.A., Gogulev I.A. Electrophysical characteristics and emission spectra of tetrafluoromethane plasma // Microelectronics. 2023. V. 52. No. 1. P. 11—19. https://doi.org/DOI: 10.31857/S0544126922700089
  15. Efremov A.M., Kwon K.H., Murin D.B. Plasma parameters and kinetics of active particles in CF4(CHF3) + Ar mixtures of variable initial composition // Microelectronics. 2018. V. 47. No. 6. P. 414—423. https://doi.org/DOI: 10.1134/S1063739718060033
  16. Efremov A.M., Murin D.B., Kwon K.-H. Plasma parameters and mechanisms of silicon etching in a mixture of CF4+CHF3+O2 // Microelectronics. 2019. V. 48. No. 6. Р. 1—9. https://doi.org/DOI: 10.1134/S1063739719060040

Supplementary files

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2. Fig. 1. Dependences of the specific power invested in the discharge on the proportion of hydrogen in the CF4/H2 mixture.

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3. Fig. 2. The dependence of the gas temperature on the proportion of hydrogen in the CF4/H2 mixture.

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4. Fig. 3. Dependences of the parameter of the reduced electric field strength E / N on the proportion of hydrogen in a mixture with CF4/H2 for i = 15 and 25 mA.

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5. Fig. 4. Overview spectrum of CF4/H2 plasma radiation (p = 100 Pa, i = 25 mA).

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6. Fig. 5. Dependence of the radiation intensity of atoms F (a) and H (b) on the proportion of H2 in the CF4/H2 mixture, i = 25 mA.

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7. Fig. 6. Dependence of the radiation intensity of molecules on the proportion of H2 in the CF4/H2 mixture, i = 25 mA.

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