编辑政策

宗旨及范围

Journal is covers technological, physical and circuit engineering problems in micro- and nanoelectronics. Special emphasis on new trends in lithography (optical, x-ray, electron, ion), etching, impurity implantation, deposition and planarization in submicron and nanometer scale.

 
 

出版周期

Periodicity: 6 issues a year.

 

Indexing

Indexing:

  • RSCI
  • translated version in Scopus
  • VAK